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ION ETCH

Surface Sculptor

Operational Brief

Focused ion beam (FIB) system for nano-machining and TEM sample preparation.

Performance Characteristics

speed30%
precision100%
force10%
reliability90%

Technical Specifications

Beam1 nm
Energy30 keV
GasXe

Material Compatibility

SemiconductorsThin Films

System Capabilities

Dual beam
Gas injection
Nanopatterning engine

Deploy This Unit

Initiate a procurement sequence or request detailed schematics for the ION ETCH.

Facility Requirements

POWER INPUT220V 1-Phase 4A
NETWORKCat6 / Fiber Optic
SYSTEM STATUS: ONLINE
Solution Finder

PRECISION ENGINEERING FOR YOUR CHALLENGE

Our diagnostic system analyzes your requirements across sector, scale, and operational parameters to recommend the optimal machinery configuration.

01 // Answer 4 technical questions

02 // Receive AI-matched recommendations

03 // Connect with our engineering team

Launch Studio
Diagnostic ProtocolSTEP 1/4

What sector are you operating in?